The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 15, 2025
Filed:
Nov. 18, 2024
Veeva Systems Inc., Pleasanton, CA (US);
Scott Edward Mitreuter, Brick, NJ (US);
Andrew Han, Needham, MA (US);
Bobby Ng, Danville, CA (US);
Katharyn A. Wilber, Boston, MA (US);
Veeva Systems Inc., Pleasanton, CA (US);
Abstract
Systems and methods for sharing updates in two repositories in a content management system. The method includes receiving integration point configuration information for integrating the first repository and the second repository. The method further includes creating a first record in the first repository for a first change and generating a plurality of impact assessments in the first repository for the first change. The method further includes assigning one impact assessment of the plurality of impact assessments to the second repository. The assigned one impact assessment identifies a medical product associated with the first change. The method includes generating a second record. The second record includes a link to the one impact assessment. The method further includes providing the impact assessment of the first repository to the user account of the second group of multiple user accounts associated with the second repository.