The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 15, 2025

Filed:

Feb. 15, 2022
Applicant:

E.a. Fischione Instruments, Inc., Export, PA (US);

Inventors:

Paul E Fischione, Export, PA (US);

Joseph M Matesa, Spring Church, PA (US);

Junhai Liu, North Huntingdon, PA (US);

Michael F Boccabella, Irwin, PA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/147 (2006.01); H01J 37/20 (2006.01); H01J 37/31 (2006.01);
U.S. Cl.
CPC ...
H01J 37/147 (2013.01); H01J 37/20 (2013.01); H01J 37/31 (2013.01); H01J 2237/2001 (2013.01); H01J 2237/20214 (2013.01); H01J 2237/20221 (2013.01);
Abstract

A system and method for the precise and uniform material removal or delayering of a large area of a sample is provided. The size of the milled area is controllable, ranging from sub-millimeter to multi-millimeter scale and the depth resolution is controllable on the nanometer scale. A controlled singularly charged ion beam is scanned across the sample surface in such a manner to normalize the ion density distribution from the sample center toward the periphery to realize uniform delayering.


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