The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 15, 2025

Filed:

Feb. 21, 2020
Applicant:

Hitachi High-tech Corporation, Tokyo, JP;

Inventors:

Kenta Yaegashi, Tokyo, JP;

Yoshisada Ebata, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 5/18 (2006.01);
U.S. Cl.
CPC ...
G02B 5/1852 (2013.01); G02B 5/1857 (2013.01); G02B 5/1861 (2013.01);
Abstract

An objective of the present invention is to improve a diffraction grating. A molding member including a substrate and a resist pattern having a surface shape including grooves is prepared. The grooves include bottom portions BPand top portions TPthat are alternately repeated in an X direction, and that each extend in a Y direction. The bottom portions adjacent to each other have an interval that changes stepwise. Next, a metal film is formed on a surface of the resist pattern to cover the grooves, and then the metal film is peeled off from the molding member. As a result, the metal film is formed to have a surface shape reverse to the surface shape of the resist pattern is formed. Top portions TPand bottom portions BPof the metal film correspond to bottom portions BPand top portions TPof the resist pattern respectively.


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