The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 15, 2025

Filed:

Aug. 04, 2020
Applicant:

Mitsubishi Heavy Industries, Ltd., Tokyo, JP;

Inventors:

Masaru Chiyomaru, Tokyo, JP;

Hiroaki Mikawa, Tokyo, JP;

Yuichi Okuzaki, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 35/00 (2006.01);
U.S. Cl.
CPC ...
G01N 35/00623 (2013.01); G01N 35/00663 (2013.01); G01N 35/00693 (2013.01); G01N 2035/00673 (2013.01);
Abstract

Provided is a concentration monitoring system which allows continuous concentration monitoring of a processing tank. The concentration monitoring system is provided with a first cycle in which a sample of a processing liquid to which a chemical has been added is taken from a processing tank in which the processing liquid is stored and supplied to a concentration meter which measures the concentration of the chemical, a second cycle in which a chemical solution having a known concentration of the chemical is supplied to the concentration meter, and a control device which controls the first cycle to evaluate the concentration of the chemical in the processing tank on the basis of the concentration of the sample measured by the concentration meter and controls the second cycle to evaluate the precision of the concentration meter on the basis of the concentration of the chemical solution measured by the concentration meter.


Find Patent Forward Citations

Loading…