The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 15, 2025

Filed:

Mar. 04, 2022
Applicant:

Soleras Advanced Coatings Bv, Deinze, BE;

Inventors:

Ignacio Caretti Giangaspro, Madrid, ES;

David Debruyne, Ghent, BE;

Freddy Fack, Mariakerke, BE;

Wilmert De Bosscher, Drongen, BE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/34 (2006.01); C04B 35/495 (2006.01); C23C 14/08 (2006.01); H01J 37/34 (2006.01);
U.S. Cl.
CPC ...
C23C 14/3414 (2013.01); C04B 35/495 (2013.01); C23C 14/083 (2013.01); H01J 37/3426 (2013.01); C04B 2235/3201 (2013.01); C04B 2235/3258 (2013.01); C04B 2235/326 (2013.01); C04B 2235/3279 (2013.01); C04B 2235/404 (2013.01); H01J 2237/332 (2013.01);
Abstract

A target for sputtering, use of the target and method of manufacture of the target is provided. The target has a single piece target material for sputter deposition, with at least 1 mm thickness of material for sputtering, having a lamellar structure and comprising a metal oxide with at least 50 wt. % or more of tungsten oxide. The atomic ratio of oxygen over tungsten results in a compound with oxygen deficiency with respect to the stoichiometric tungsten oxide. The method includes spraying metallic tungsten and/or tungsten oxide powder in amounts so as to provide a layer of material for sputtering being at least 1 mm thick and comprising non-stoichiometric tungsten oxide.


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