The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 08, 2025

Filed:

Aug. 15, 2022
Applicant:

Kioxia Corporation, Tokyo, JP;

Inventors:

Junichi Kaneyama, Yokkaichi Mie, JP;

Keiichi Sawa, Yokkaichi Mie, JP;

Hiroyuki Yamashita, Yokkaichi Mie, JP;

Assignee:

KIOXIA CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10B 43/27 (2023.01); H10D 64/01 (2025.01); H10D 64/68 (2025.01);
U.S. Cl.
CPC ...
H10B 43/27 (2023.02); H10D 64/037 (2025.01); H10D 64/685 (2025.01);
Abstract

A semiconductor device includes a plurality of electrode layers separated from each other in a first direction, a charge storage layer provided on side surfaces of the plurality of electrode layers via a first insulating film, and a semiconductor layer provided on a side surface of the charge storage layer via a second insulating film. The charge storage layer includes a location having a fluorine concentration of 5.0×10atoms/cmor less. A fluorine concentration at an interface between the charge storage layer and the second insulating film is 10 times or more or 1/10 or less of a fluorine concentration at an interface between the charge storage layer and the first insulating film.


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