The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 08, 2025

Filed:

Feb. 02, 2023
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventors:

Sooyoung Ji, Suwon-si, KR;

Minho Kim, Suwon-si, KR;

Dongouk Moon, Suwon-si, KR;

Sanghwa Jin, Suwon-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H04N 5/265 (2006.01); G06T 1/20 (2006.01); G06T 1/60 (2006.01); G06T 7/13 (2017.01); G06T 7/174 (2017.01); G06T 11/00 (2006.01);
U.S. Cl.
CPC ...
H04N 5/265 (2013.01); G06T 1/20 (2013.01); G06T 1/60 (2013.01); G06T 7/13 (2017.01); G06T 7/174 (2017.01); G06T 11/001 (2013.01); G06T 2207/20212 (2013.01); G06T 2210/52 (2013.01);
Abstract

An accelerator includes a memory access module configured to acquire a plurality of original images for generating a VR image from a input device, and a computing module including a stitching region detector, a stitching processor, an image processor, and a combination processor. The memory access module is configured to transmit the plurality of original images to the stitching region detector. The stitching region detector is configured to detect at least one stitching region and an image region from each of the plurality of original images by performing detection processing on each of the plurality of original images received from the memory access module, to provide the at least one stitching region to the stitching processor, and to provide the image region to the image processor. The stitching processor is configured to generate at least one post-processed stitching region.


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