The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 08, 2025

Filed:

Jul. 05, 2023
Applicant:

University of Massachusetts, Boston, MA (US);

Inventors:

James Watkins, South Hadley, MA (US);

Michael R. Beaulieu, Chicopee, MA (US);

Nicholas R. Hendricks, South Deerfield, MA (US);

Assignee:

UNIVERSITY OF MASSACHUSETTS, Boston, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 3/10 (2006.01); G02B 1/118 (2015.01); H01B 1/08 (2006.01); H01B 3/10 (2006.01); H01B 13/00 (2006.01); H01M 4/04 (2006.01); H01M 6/40 (2006.01); H01M 8/124 (2016.01); H10K 71/20 (2023.01); B82Y 30/00 (2011.01); H01M 8/1286 (2016.01); H10K 30/82 (2023.01); H10K 50/813 (2023.01); H10K 102/00 (2023.01);
U.S. Cl.
CPC ...
H01M 4/04 (2013.01); G02B 1/118 (2013.01); H01B 1/08 (2013.01); H01B 3/10 (2013.01); H01B 13/003 (2013.01); H01M 6/40 (2013.01); H01M 8/124 (2013.01); H10K 71/211 (2023.02); B82Y 30/00 (2013.01); H01M 4/0433 (2013.01); H01M 8/1286 (2013.01); H10K 30/82 (2023.02); H10K 50/813 (2023.02); H10K 2102/331 (2023.02); Y02P 70/50 (2015.11); Y10T 428/24893 (2015.01);
Abstract

Aspects relate to patterned nanostructures having a feature size not including film thickness of below 5 microns. The patterned nanostructures are made up of nanoparticles having an average particle size of less than 100 nm. A nanoparticle composition, which, in some cases, includes a binder, is applied to a substrate. A patterned mold used in concert with electromagnetic radiation function to manipulate the nanoparticle composition in forming the patterned nanostructure. In some embodiments, the patterned mold nanoimprints a pattern onto the nanoparticle composition and the composition is cured through UV or thermal energy. Three-dimensional patterned nanostructures may be formed. A number of patterned nanostructure layers may be prepared and joined together. In some cases, a patterned nanostructure may be formed as a layer that is releasable from the substrate upon which it is initially formed. Such releasable layers may be arranged to form a three-dimensional patterned nanostructure for suitable applications.


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