The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 08, 2025
Filed:
Mar. 04, 2024
Applicant:
Nanya Technology Corporation, New Taipei, TW;
Inventor:
Hsih-Yang Chiu, New Taipei, TW;
Assignee:
NANYA TECHNOLOGY CORPORATION, New Taipei, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/525 (2006.01); H01L 21/02 (2006.01); H10D 84/00 (2025.01);
U.S. Cl.
CPC ...
H01L 23/5252 (2013.01); H01L 21/0223 (2013.01); H01L 21/02255 (2013.01); H10D 84/209 (2025.01);
Abstract
A method of forming the electrical fuse matrix includes forming a seed layer on a plurality of bottom metal plates extending in a first direction; forming a plurality of poly-silicon cylinders on the seed layer; forming a spacer surrounding the plurality of poly-silicon cylinders and covering the seed layer; forming a plurality of hourglass-shaped trenches between the poly-silicon cylinders by removing a portion of the spacer; forming a plurality of anti-fuse structures in the hourglass-shaped trenches; and forming a plurality of top metal plates on the anti-fuse structures.