The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 08, 2025

Filed:

Dec. 13, 2021
Applicant:

Asm Ip Holding B.v., Almere, NL;

Inventors:

Siyao Luan, Phoenix, AZ (US);

Peipei Gao, Chandler, AZ (US);

Xing Lin, Chandler, AZ (US);

Alexandros Demos, Scottsdale, AZ (US);

Kishor Patil, Chandler, AZ (US);

Assignee:

ASM IP Holding B.V., Almere, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); C23C 16/455 (2006.01); C23C 16/458 (2006.01); C23C 16/52 (2006.01); H01L 21/687 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67259 (2013.01); C23C 16/455 (2013.01); C23C 16/4582 (2013.01); C23C 16/52 (2013.01); H01L 21/68742 (2013.01);
Abstract

A fixture includes a frame, a leveling plate, a bracket, and a laser profiler. The frame is arranged for fixation above a reaction chamber arranged to deposit a film onto a substrate. The leveling plate is supported on the frame. The bracket is supported on the leveling plate. The laser profiler is suspended from the bracket, overlays the reaction chamber, and has a field of view that extends through the leveling plate and the frame to determine position of a target within the reaction chamber. Semiconductor processing systems and methods of determining position of targets within reaction chambers in semiconductor processing systems are also described.


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