The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 08, 2025

Filed:

Dec. 04, 2020
Applicant:

Hitachi High-tech Corporation, Tokyo, JP;

Inventors:

Hideki Hasegawa, Tokyo, JP;

Masuyuki Sugiyama, Tokyo, JP;

Yuichiro Hashimoto, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 49/16 (2006.01); G01N 30/72 (2006.01); H01J 49/04 (2006.01);
U.S. Cl.
CPC ...
H01J 49/167 (2013.01); G01N 30/7266 (2013.01); H01J 49/0404 (2013.01);
Abstract

There are provided an ion source that can accurately and efficiently grasp whether a tip end position on a capillary downstream side is proper and a control method therefor. An ion source according to an embodiment of the present invention measures an electric current generated due to the application of a voltage to a capillary by a power supply when a sample is not introduced into the capillary. When the electric current is within tolerance, the ion source outputs projection amount information expressing that the projection amount of the capillary is proper, and the ion source outputs the projection amount information expressing that the projection amount is improper when the projection amount is not within the tolerance.


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