The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 08, 2025
Filed:
Dec. 08, 2021
Toshiba Mitsubishi-electric Industrial Systems Corporation, Tokyo, JP;
Kensuke Watanabe, Tokyo, JP;
Ren Arita, Tokyo, JP;
TMEIC CORPORATION, Tokyo, JP;
Abstract
One direction discharge structure in an active gas generation apparatus satisfies arrangement conditions (a) to (c). The condition (a) is a condition that a region where a corresponding metal electrode and a corresponding metal electrode are overlapped with each other in a plan view serves as a corresponding discharge space in a corresponding gap region. The condition (b) is a condition that the corresponding gap region and a plurality of gas supply holes provided in a corresponding gas supply region are overlapped with each other in a plan view. The condition (c) is a condition that the plurality of gas supply holes provided in the corresponding gas supply region and a plurality of gas ejection holes provided below the corresponding gap region sandwich the corresponding discharge space in a plan view, and are disposed to face each other on a one-to-one basis along a Y direction.