The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 08, 2025
Filed:
Feb. 24, 2025
Yantai University, Yantai, CN;
Zhaowei Liu, Yantai, CN;
Haonan Wen, Yantai, CN;
Yongchao Song, Yantai, CN;
Wenhan Hou, Yantai, CN;
Xinxin Zhao, Yantai, CN;
Tengjiang Wang, Yantai, CN;
Diantong Liu, Yantai, CN;
Weiqing Yan, Yantai, CN;
Peng Song, Yantai, CN;
Anzuo Jiang, Yantai, CN;
Hang Su, Yantai, CN;
YANTAI UNIVERSITY, Yantai, CN;
Abstract
The present invention relates to the technical field of expression recognition, and in particular, to an expression recognition method and system based on multi-scale features and spatial attention. The method includes: performing feature extraction on acquired facial image data by using an HNFER neural network model to obtain an original input feature map; performing pooling and concatenation on extracted features based on a CoordAtt attention mechanism to obtain a feature map; performing deep convolution processing on the feature map to obtain an attention map, and then performing element-by-element multiplication to obtain a final feature map; and performing feature transformation and normalization on the final feature map to obtain an expression category probability and output the expression category probability. In the present invention, by integrating scale perception and spatial attention technologies, the model can recognize and classify different emotional states more accurately and maintain high performance even under complex environmental conditions.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile