The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 08, 2025

Filed:

Mar. 20, 2023
Applicant:

Amazon Technologies, Inc., Seattle, WA (US);

Inventors:

Amin Kheradmand, Mountain View, CA (US);

Jiayun Wang, Berkeley, CA (US);

Himanshu Arora, Sunnyvale, CA (US);

Assignee:

Amazon Technologies, Inc., Seattle, WA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06V 10/80 (2022.01); G06T 3/18 (2024.01); G06T 5/77 (2024.01); G06T 7/73 (2017.01); G06V 10/25 (2022.01); G06V 10/44 (2022.01);
U.S. Cl.
CPC ...
G06V 10/806 (2022.01); G06T 3/18 (2024.01); G06T 5/77 (2024.01); G06T 7/73 (2017.01); G06V 10/25 (2022.01); G06V 10/44 (2022.01); G06T 2207/20081 (2013.01); G06T 2207/30196 (2013.01);
Abstract

Techniques for image generation based on a multi-image set and pose data is described herein. In an example, a computer system generates, by at least using a first machine learning (ML) model, a pose feature based on pose data that indicates a target pose. The computer system generates, by at least using a second ML model, a first appearance feature based on a first image and the pose data. The computer system generates, by at least using the second ML model, a second appearance feature based on a second image and the pose data. The computer system generates a combined appearance feature based on the first appearance feature and the second appearance feature. The computer system generates, by at least using a third ML model, a third image showing an appearance of an element in the target pose based on the pose feature and the combined appearance feature.


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