The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 08, 2025
Filed:
May. 27, 2022
Applicant:
Salesforce, Inc., San Francisco, CA (US);
Inventors:
Junnan Li, Singapore, SG;
Chu Hong Hoi, Singapore, SG;
Assignee:
Salesforce, Inc., San Francisco, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06N 3/088 (2023.01); G06V 10/75 (2022.01); G06V 10/764 (2022.01); G06V 10/82 (2022.01);
U.S. Cl.
CPC ...
G06N 3/088 (2013.01); G06V 10/751 (2022.01); G06V 10/764 (2022.01); G06V 10/82 (2022.01);
Abstract
Embodiments described herein provide a masked self-training (MaST) which is an unsupervised learning approach leveraging two complimentary sources of supervision: pseudo-labels and raw image pixels. Specifically, MaST jointly optimizes three objectives to finetune a pre-trained classification model on unlabeled images: (1) self-training objective to learn global task-specific class prediction; (2) masked image modeling objective to learn local pixel-level information; (3) global-local feature alignment objective to bridge the knowledge learned from the two sources of supervision.