The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 08, 2025
Filed:
Jul. 25, 2023
Foundation of Soongsil University-industry Cooperation, Seoul, KR;
Dong-Ryoung Lee, Seoul, KR;
Abstract
The present subject matter provides a high-speed nanopatterning method and apparatus of two-color super-resolution photolithography. According to the present subject matter, a high-speed nanopatterning apparatus of two-color super-resolution photolithography comprises: a first light source for outputting photochemical reaction initiation light of a first wavelength causing a photochemical reaction to occur in an illuminated area of a photoresist; a first lens for enlarging a beam size of the photochemical reaction initiation light; a second light source for outputting inhibition light of a second wavelength suppressing the photochemical reaction in the illuminated area of the photoresist; a second lens for enlarging a beam size of the inhibition light; and a digital micromirror device including a plurality of micromirrors controlled at a first angle and a second angle and for reflecting a portion of the photochemical reaction initiation light output from the first light source or the inhibition light output from the second light source toward the photoresist through the plurality of micromirrors.