The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 08, 2025

Filed:

Jun. 18, 2023
Applicants:

Tin Komljenovic, Goleta, CA (US);

Minh Tran, Goleta, CA (US);

Zeyu Zhang, Goleta, CA (US);

Chong Zhang, Santa Barbara, CA (US);

Inventors:

Tin Komljenovic, Goleta, CA (US);

Minh Tran, Goleta, CA (US);

Zeyu Zhang, Goleta, CA (US);

Chong Zhang, Santa Barbara, CA (US);

Assignee:

NEXUS PHOTONICS, INC, Goleta, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 6/27 (2006.01);
U.S. Cl.
CPC ...
G02B 6/2793 (2013.01); G02B 6/2766 (2013.01);
Abstract

A device has first, second and third elements fabricated on a common substrate. The first element supports a first optical mode in an active waveguide structure characterized by a mesa. The second element supports a second optical mode in a passive waveguide structure. The third element, at least partly butt-coupled to the first element, supports an intermediate optical mode in an intermediate waveguide structure characterized by a waveguide core cross section including a shallow step. A tapered waveguide structure in at least one of the second and third elements facilitates efficient adiabatic transformation between the second optical mode and the intermediate optical mode. No adiabatic transformation occurs between the intermediate optical mode and the first optical mode. Lithographic alignment marks facilitate precise alignment of the three elements during device fabrication.


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