The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 08, 2025
Filed:
Dec. 13, 2019
Applicant:
Rensselaer Polytechnic Institute, Troy, NY (US);
Inventors:
Nadarajah Narendran, Clifton Park, NY (US);
Ukwatte Lokuliyanage Indika Upendra Perera, Clifton Park, NY (US);
Assignee:
Rensselaer Polytechnic Institute, Troy, NY (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
F21V 13/04 (2006.01); B33Y 80/00 (2015.01); F21V 5/04 (2006.01); F21V 5/08 (2006.01);
U.S. Cl.
CPC ...
F21V 13/04 (2013.01); B33Y 80/00 (2014.12); F21V 5/04 (2013.01); F21V 5/08 (2013.01);
Abstract
In an embodiment, there is provided a three-dimensional (3-D) optic for beam shaping. The 3-D optic includes a first surface, a second surface and a beam forming feature. The first surface is configured to receive incident light. The second surface is positioned relative to the first surface and is configured to emit a light beam having a shape. The emitted beam shape is related to the beam forming feature. The beam forming feature is formed by a 3-D manufacturing process.