The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 08, 2025

Filed:

Mar. 16, 2021
Applicant:

Mazor Robotics Ltd., Caesarea, IL;

Inventors:

Leonid Kleyman, Atzmon Misgav, IL;

Liron Itan, Hadera, IL;

Noa Mor, Tel Aviv, IL;

Anna Ostap Yaacoby, Haifa, IL;

Or Riven, Haifa, IL;

Adi Steinmetz, Tel Aviv, IL;

Dor Artzi, Tel Aviv-Jaffa, IL;

Assignee:

Mazor Robotics Ltd., Caesarea, IL;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
A61F 2/46 (2006.01); A61B 34/00 (2016.01); A61B 34/20 (2016.01); A61B 34/30 (2016.01); A61F 2/44 (2006.01); G06N 20/00 (2019.01); G16H 20/40 (2018.01); G16H 50/50 (2018.01);
U.S. Cl.
CPC ...
A61F 2/46 (2013.01); A61F 2/44 (2013.01); G06N 20/00 (2019.01); G16H 20/40 (2018.01); G16H 50/50 (2018.01); A61B 34/20 (2016.02); A61B 2034/252 (2016.02); A61B 34/30 (2016.02); A61F 2002/4633 (2013.01);
Abstract

Systems and methods for training an implant plan evaluation model is provided. A first implant plan option having a first set of parameters and a second implant plan option having a second set of parameters may be received. The first set of parameters and the second set of parameters may be inputted into a model configured to score the first implant plan option based on the first set of parameters and the second implant plan option based on the second set of parameters. The score of the first implant plan option and the score of the second implant plan option may be compared. when the score of the second implant plan option is higher than the score of the first implant plan option the model may be adjusted to score the first implant plan option higher than the second implant plan option.


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