The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 01, 2025

Filed:

May. 01, 2023
Applicant:

Fuji Electric Co., Ltd., Kanagawa, JP;

Inventors:

Yuichi Onozawa, Matsumoto, JP;

Kota Ohi, Matsumoto, JP;

Assignee:

FUJI ELECTRIC CO., LTD., Kanagawa, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10D 84/80 (2025.01); H01L 21/265 (2006.01); H01L 21/266 (2006.01); H10D 8/00 (2025.01); H10D 10/40 (2025.01); H10D 12/00 (2025.01); H10D 30/60 (2025.01); H10D 62/10 (2025.01); H10D 62/13 (2025.01); H10D 62/17 (2025.01); H10D 64/00 (2025.01); H10D 64/27 (2025.01); H10D 84/01 (2025.01); H10D 84/03 (2025.01); H10D 12/01 (2025.01);
U.S. Cl.
CPC ...
H10D 84/811 (2025.01); H01L 21/2652 (2013.01); H01L 21/26586 (2013.01); H01L 21/266 (2013.01); H10D 12/481 (2025.01); H10D 30/60 (2025.01); H10D 62/105 (2025.01); H10D 62/127 (2025.01); H10D 62/142 (2025.01); H10D 62/393 (2025.01); H10D 64/117 (2025.01); H10D 64/519 (2025.01); H10D 84/0109 (2025.01); H10D 84/038 (2025.01); H10D 8/422 (2025.01); H10D 10/441 (2025.01); H10D 12/035 (2025.01); H10D 62/126 (2025.01); H10D 62/133 (2025.01);
Abstract

A device includes a substrate, a drift region in the substrate, a base region above the drift region; a first high concentration region selectively formed in a part on a surface side of the base region and having a concentration higher than the drift region; a trench portion formed in a front surface of the substrate and including extending portions; and mesa portions between the extending portions. The mesa portions includes first mesa portions having the first high concentration region and second mesa portions not having the first high concentration region, the trench portion includes a first trench portion having an first conductive portion (a gate conductive portion) and adjacent to the first mesa portion, a second trench portion having the first conductive portion and adjacent to the second mesa portion, and a third trench portion having an second conductive portion and adjacent to the first or second mesa portion.


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