The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 01, 2025

Filed:

Apr. 19, 2022
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventors:

Taejin Park, Yongin-si, KR;

Jangeun Lee, Hwaseong-si, KR;

Huijung Kim, Seongnam-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/00 (2006.01); H10B 12/00 (2023.01); H10D 64/01 (2025.01); H10D 64/27 (2025.01);
U.S. Cl.
CPC ...
H10D 64/518 (2025.01); H10B 12/053 (2023.02); H10B 12/315 (2023.02); H10B 12/34 (2023.02); H10D 64/01 (2025.01); H10D 64/513 (2025.01); H10D 64/514 (2025.01); H10B 12/0335 (2023.02);
Abstract

A gate structure may include a first gate electrode extending in a first direction, a second gate electrode on a portion of the first gate electrode, a gate mask on the first and second gate electrodes, and a gate insulation pattern on a lower surface and a sidewall of the first gate electrode and sidewalls of the second gate electrode and the gate mask. The gate structure is in an upper portion of a substrate. A grain size of the second gate electrode is greater than a grain size of the first gate electrode.


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