The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 01, 2025

Filed:

Jun. 19, 2019
Applicants:

The Penn State Research Foundation, University Park, PA (US);

United States Department of Energy, Washington, DC (US);

Inventors:

Paul R. Ohodnicki, Jr., Allison Park, PA (US);

Kevin Byerly, Pittsburgh, PA (US);

Dinesh Agrawal, State College, PA (US);

Michael Lanagan, State College, PA (US);

Assignees:

The Penn State Research Foundation, University Park, PA (US);

United States Department of Energy, Washington, DC (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05B 6/80 (2006.01); C21D 1/26 (2006.01); C21D 1/34 (2006.01); C21D 11/00 (2006.01); C22F 1/00 (2006.01); H05B 6/68 (2006.01);
U.S. Cl.
CPC ...
H05B 6/80 (2013.01); C21D 1/26 (2013.01); C21D 1/34 (2013.01); C21D 11/00 (2013.01); C22F 1/00 (2013.01); H05B 6/68 (2013.01);
Abstract

Methods and systems including a microwave radiation source are described. A first region of a pure magnetic field can be generated in a first processing zone using a microwave radiation source of the first processing zone. The first processing zone can be a single mode microwave radiation chamber. A second region of a pure electric field can be generated in the first processing zone using the microwave radiation source. The second region can be spatially distinct from the first region. A first portion of an amorphous alloy can be loaded automatically into the first processing zone. The first portion can be positioned in an annealing region. The annealing region can be a single field region selected from the first region and the second region. The first portion can be heated in the annealing region. The first portion can be automatically unloaded from the first processing zone.


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