The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 01, 2025

Filed:

Oct. 01, 2020
Applicant:

Prodrive Technologies Innovation Services B.v., Son en Breugel, NL;

Inventors:
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); C23C 16/515 (2006.01); G01R 19/00 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32917 (2013.01); C23C 16/515 (2013.01); G01R 19/0046 (2013.01); H01J 37/32146 (2013.01); H01L 21/02 (2013.01); H01J 2237/24564 (2013.01);
Abstract

An ion energy for plasma processing of a dielectric substrate is determined by exposing the dielectric substrate to a plasma discharge and applying a pulsed voltage waveform. This waveform includes a sequence of pulses, each having a higher voltage interval and a lower voltage interval having a voltage slope. First pulses of the sequence having differing voltage slopes are generated and applied to the dielectric substrate. For each first pulse, the voltage slope and a corresponding output current are determined. For each first pulse, at least one coefficient of a mathematical relation between the voltage slope and the corresponding output current based solely on the voltage slope and the output current determined for one or more of the first pulses is determined. A test function is applied and an optimal voltage slope value corresponding to the at least one coefficient making the test function true is selected.


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