The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 01, 2025
Filed:
Apr. 08, 2022
Udmtek, Suwon-Si, KR;
Gi Nam Wang, Yongin-Si, KR;
Jun Pyo Park, Suwon-Si, KR;
Yeon Dong Kim, Hwaseong-Si, KR;
Nam Ki Kim, Suwon-Si, KR;
Hee Chan Yang, Suwon-Si, KR;
Yoon Woo Ha, Suwon-Si, KR;
Seung Jong Jin, Suwon-Si, KR;
UDMTEK, Suwon-Si, KR;
Abstract
The present disclosure discloses a master pattern generation method which is a major pattern in a repeated cycle by analyzing programmable logic controller (PLC) logic, and a method for training a model that may analyze an error of a cycle using the generated master pattern. The master pattern generation method and the training method for a cycle analysis model according to the present disclosure are different from the related art in that the methods are a technology of processing a machine control language (low-level language) that is difficult for humans to analyze and converting the machine control language into an analyzable language (high-level language), i.e., a machine language processing (MLP)-based technology that analyzes the executed machine language (a language that controls a machine) with a computer and can be understood by humans.