The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 01, 2025
Filed:
Sep. 23, 2020
Hoya Corporation, Tokyo, JP;
Masanori Nakagawa, Tokyo, JP;
HOYA CORPORATION, Tokyo, JP;
Abstract
Provided is a substrate with a multilayer reflective film, the substrate being used for manufacturing a reflective mask blank and a reflective mask each having a multilayer reflective film having a high reflectance to exposure light and a low background level during defect inspection. A substrate with a multilayer reflective filmcomprises a substrateand a multilayer reflective film. The multilayer reflective filmis formed of a multilayer film in which a low refractive index layer and a high refractive index layer are alternately layered on the substrate. The multilayer reflective filmcomprises at least one additive element selected from hydrogen (H), deuterium (D), and helium (He). The additive element in the multilayer reflective filmhas an atomic number density of 0.006 atom/nmor more and 0.50 atom/nmor less.