The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 01, 2025

Filed:

Aug. 14, 2019
Applicant:

Hitachi High-tech Corporation, Tokyo, JP;

Inventors:

Toshifumi Honda, Tokyo, JP;

Shunichi Matsumoto, Tokyo, JP;

Nobuhiro Obara, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 21/956 (2006.01); G01N 21/01 (2006.01); G01N 21/47 (2006.01); G01N 21/88 (2006.01);
U.S. Cl.
CPC ...
G01N 21/956 (2013.01); G01N 21/47 (2013.01); G01N 21/8851 (2013.01); G01N 2021/0162 (2013.01); G01N 2021/8841 (2013.01);
Abstract

A defect inspection apparatus including illumination optical system configured to irradiate a sample with an illumination spot; a detector arrangement configured to detect, from a plurality of directions, reflected light from the sample; a scanning controller configured to control a scan of the sample with the illumination spot by overlapping detection regions such that the detection regions partially overlap; and a signal processor configured to process a signal obtained by detecting the reflected light from the sample by the detection unit to detect a defect. The signal processor is configured to synthesize an integrated signal by processing the signal detected a plurality of times by overlapping the reflected light of the sample for each detection region by the detection unit; and to detect the defect on a surface of the sample based on the synthesized integrated signal.


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