The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 01, 2025
Filed:
Apr. 20, 2021
Olympus Corporation, Tokyo, JP;
Yosuke Sato, Hachioji, JP;
OLYMPUS CORPORATION, Tokyo, JP;
Abstract
An eccentricity measurement method includes first to eighth steps. In the first step, an eccentricity measurement device for relatively linearly moving an optical image for measurement to an optical unit under test and acquiring an image on an observed surface orthogonal to a reference axis defined by a relative movement trajectory of the optical image is provided. In the second step, a position of a reference point is identified. In the third step, an optical unit under test is arranged. In the fourth step, the optical image is projected onto a projection position on the reference axis and a reflected image reflected on the surface under test is formed at an observation position where a distance from the projection position is a set value L. In the fifth step, a measurement image is acquired. In the sixth step, an image of the reflected image is identified. In the seventh step, an amount of positional deviation of the image of the reflected image is measured. In the eighth step, an amount of eccentricity of the apparent spherical center of the surface under test is calculated.