The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 01, 2025

Filed:

Jun. 14, 2021
Applicant:

Hitachi High-tech Corporation, Tokyo, JP;

Inventors:

Yutaka Okuyama, Tokyo, JP;

Takeshi Ohmori, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 21/04 (2006.01); G06T 7/00 (2017.01); G06T 7/60 (2017.01); H01J 37/22 (2006.01);
U.S. Cl.
CPC ...
G01B 21/04 (2013.01); G06T 7/0006 (2013.01); G06T 7/60 (2013.01); H01J 37/222 (2013.01); G01B 2210/56 (2013.01); G06T 2207/30148 (2013.01); H01J 2237/2817 (2013.01);
Abstract

A computer system providing a function for: extracting, from image data of a semiconductor pattern, coordinate information of a base point for measuring a dimension of a desired location of the semiconductor pattern; and measuring the dimension using the coordinate information of the base point. The computer system includes a training device in which a pose estimation model for outputting coordinate information of at least two base points as a training result is implemented. The training device is trained in advance using teacher data having the image data of the semiconductor pattern as an input and the coordinate information of at least two base points as an output, and extracts, for new image data input into the training device, the coordinate information of at least two base points and a dimension.


Find Patent Forward Citations

Loading…