The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 01, 2025

Filed:

May. 26, 2020
Applicant:

Sika Technology Ag, Baar, CH;

Inventors:

Zhiyong Song, Suzhou, CN;

Michael Schlumpf, Stallikon, CH;

Assignee:

SIKA TECHNOLOGY AG, Baar, CH;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08G 18/10 (2006.01); C08G 18/12 (2006.01); C08G 18/30 (2006.01); C08G 18/32 (2006.01); C08G 18/38 (2006.01); C08G 18/48 (2006.01); C08L 75/08 (2006.01);
U.S. Cl.
CPC ...
C08G 18/307 (2013.01); C08G 18/12 (2013.01); C08G 18/3256 (2013.01); C08G 18/3819 (2013.01); C08G 18/4829 (2013.01); C08G 18/4841 (2013.01); C08L 75/08 (2013.01); C08G 2190/00 (2013.01);
Abstract

A moisture-curable composition, including: a) at least one polyurethane polymer P having isocyanate groups; b) at least one blocked polyamine BA having blocked, hydrolytically activatable amino groups; and c) at least one monoamine MA of formula (V), where Rrepresents a linear, cyclic, or branched alkyl or alkenyl radical or optionally substituted aryl radical with 1 to 12 C atoms and optionally including ether oxygen atoms; Rand Reither independently represent a rest Ror a hydrogen atom, where at least one of Rand Ris a hydrogen atom, or Rand Rtogether with the N atom of monoamine MA form an aldimine group that under influence of water hydrolyzes to a aldehyde and an amine R—NH; wherein polymer P is the reaction product of 2,4- and/or 2,6-toluylene diisocyanate (TDI) and at least one polyol, wherein the polyol has an average functionality of >2.


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