The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 01, 2025
Filed:
Apr. 29, 2022
Industry-academic Cooperation Foundation, Yonsei University, Seoul, KR;
University-industry Cooperation Group of Kyung Hee University, Yongin-si, KR;
Seung Ah Lee, Seoul, KR;
Kyung Chul Lee, Yongin-si, KR;
Nak Kyu Baek, Seoul, KR;
Wook Park, Suwon-si, KR;
Jung Hyun Bae, Yongin-si, KR;
Jaewoo Jung, Seoul, KR;
Abstract
An apparatus for manufacturing phase masks for lens-less camera includes: a light source; a digital image mirror that receives a two-dimensional map, reflects the light irradiated from the light source with different intensities for each location and outputs reflected light; a two-dimensional map generator for generating the 2D map for adjusting the intensity of reflected light for each position such that the phase mask has a unique pattern of a different height for each position from a point spread function acquired in advance depending on the purpose of use of the phase mask; and a material holder on which a photo-curable film is disposed that is irradiated with the reflected light and cured to different depths depending on the light intensity for each position of the irradiated reflected light.