The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 24, 2025

Filed:

Dec. 16, 2024
Applicant:

Sas Institute Inc., Cary, NC (US);

Inventors:

Chengpeng Zeng, Ames, IA (US);

Kai Shen, Apex, NC (US);

Zohreh Asgharzadeh Talebi, Raleigh, NC (US);

Assignee:

SAS Institute Inc., Cary, NC (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H04L 9/40 (2022.01); G16Y 30/10 (2020.01); H04L 41/16 (2022.01);
U.S. Cl.
CPC ...
H04L 63/1425 (2013.01); G16Y 30/10 (2020.01); H04L 41/16 (2013.01);
Abstract

Functions representing sequences of values of a time-series dataset measured within a particular time period are accessed. For a current time window of the time period, a first discretized covariance function is computed that represents a relationship between each value measured within the current time window. Eigenanalysis of the first covariance function is performed to estimate first eigenfunctions. The current time window is incremented to obtain a subsequent time window that overlaps a majority of the current time window at a shared window region. A second discretized covariance function is computed for the subsequent time window and eigenanalysis is performed to estimate second normalized eigenfunctions. An angle change is computed between a portion of the first normalized eigenfunctions and a corresponding portion of the second normalized eigenfunctions located within the shared window region. Based on the angle change, an anomaly detection output is generated.


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