The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 24, 2025

Filed:

Dec. 23, 2024
Applicant:

Xidian University, Xi'an, CN;

Inventors:

Xun Li, Xi'an, CN;

Yuanchen Zeng, Xi'an, CN;

Jie Wu, Xi'an, CN;

Zaipeng Han, Xi'an, CN;

Assignee:

Xidian University, Xi'an, CN;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H04B 17/391 (2015.01); H01Q 21/00 (2006.01); H01Q 21/06 (2006.01);
U.S. Cl.
CPC ...
H04B 17/3912 (2015.01); H01Q 21/0006 (2013.01); H01Q 21/061 (2013.01);
Abstract

An efficient synthesis method for a radiation pattern of a conformal array antenna is provided. The method includes: step 1, establishing a field analysis model of the conformal array antenna; determining an aperture field distribution principle suitable for the conformal array antenna, and expanding distribution of an excitation I of an arbitrary curved surface source in a spherical coordinate system according to the aperture field distribution principle; and step 3, establishing an optimization model for the radiation pattern of the conformal array antenna, and performing synthesis of the radiation pattern of the conformal array antenna according to the optimization model. The method greatly improves the synthesis efficiency of a radiation pattern of a conformal array antenna while ensuring that the directional pattern requirements are met.


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