The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 24, 2025
Filed:
Jul. 29, 2020
Samsung Display Co., Ltd., Yongin-Si, KR;
Jun Woo You, Seongnam-si, KR;
Byoung Dae Ye, Yongin-si, KR;
Tae Ho Lee, Hwaseong-si, KR;
Atsushi Nemoto, Suwon-si, KR;
Samsung Display Co., Ltd., Yongin-si, KR;
Abstract
A conductive pattern forming method according to an embodiment includes: forming a first conductive pattern on a substrate; sequentially forming a release layer and a conductive layer on a transfer substrate that includes a mask; irradiating intense pulsed light (IPL) to the substrate where the first conductive pattern is formed; placing the transfer substrate on the substrate; transferring a portion of the conductive layer, corresponding to an opening of the mask, onto the substrate by irradiating the IPL to the transfer substrate to form a second conductive pattern on the substrate.