The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 24, 2025

Filed:

Mar. 14, 2023
Applicant:

Toto Ltd., Kitakyushu, JP;

Inventors:

Akihito Ono, Kitakyushu, JP;

Jumpei Uefuji, Kitakyushu, JP;

Assignee:

Toto Ltd., Fukuoka, JP;

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/683 (2006.01); H01J 37/32 (2006.01); H05B 3/26 (2006.01);
U.S. Cl.
CPC ...
H01L 21/6833 (2013.01); H01J 37/32724 (2013.01); H05B 3/265 (2013.01); H01J 2237/002 (2013.01); H01J 2237/2007 (2013.01);
Abstract

An electrostatic chuck includes a ceramic dielectric substrate, a base plate, and a heater unit. The heater unit includes first and second heater elements. The first heater element includes a first zone. The first heater element includes first and second protruding portions. The first zone includes a first facing region in which the first protruding portion and the second protruding portion are disposed so as to face and be adjacent to each other. The second heater element includes a second zone. The second zone includes a central region and an outer peripheral region. The central region is positioned at a center of the second zone. The outer peripheral region is positioned outside the central region. The first facing region is located at a position where the first facing region overlaps the central region.


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