The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 24, 2025
Filed:
Jun. 10, 2020
Applicant:
Furuya Metal Co., Ltd., Tokyo, JP;
Inventors:
Tomohiro Maruko, Tokyo, JP;
Hitoshi Arakawa, Tokyo, JP;
Shohei Otomo, Tokyo, JP;
Yu Suzuki, Tokyo, JP;
Assignee:
FURUYA METAL CO., LTD., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/34 (2006.01); C23C 14/14 (2006.01); C23C 14/34 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3426 (2013.01); C23C 14/14 (2013.01); C23C 14/3414 (2013.01); H01J 37/3423 (2013.01); H01J 37/3491 (2013.01); H01J 2237/332 (2013.01);
Abstract
A ruthenium-based sputtering target having a cast structure, in which a sputter surface of the sputtering target includes at least two or more types of regions, and crystal surfaces in the regions are different from each other, each of the crystal surfaces being specified by a main peak of X-ray diffraction.