The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 24, 2025
Filed:
Jan. 08, 2020
The Industry & Academic Cooperation IN Chungnam National University, Daejeon, KR;
Shinjae You, Daejeon, KR;
Sangho Lee, Seoul, KR;
Sijun Kim, Daejeon, KR;
Jangjae Lee, Daejeon, KR;
Yeongseok Lee, Jeju-si, KR;
Junghyeng Kim, Daejeon, KR;
Abstract
Proposed are non-invasive diagnostic method and apparatus for plasma processes in which plasma processes can be monitored in real time by measuring a surface wave resonance frequency generated in plasma or a sheath on the basis of a surface wave resonance principle. The diagnostic method may include a step (S) of installing at least one probe on one side of an electrostatic chuck (ESC) or on an inner wall of a chamber, a step (S) of emitting a high frequency onto the plasma or the sheath by the probe, and a step (S) of detecting a frequency reflected from the plasma or the sheath by the probe. In addition, the diagnostic method may include the step (S) of extracting a reflection spectrum, a step (S) of extracting the surface wave resonance frequency, and a step (S) of extracting electron density or uniformity of the plasma.