The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 24, 2025
Filed:
Jun. 16, 2023
Panasonic Intellectual Property Management Co., Ltd., Osaka, JP;
Naoaki Takeda, Osaka, JP;
Shogo Okita, Hyogo, JP;
Seiya Nagano, Osaka, JP;
Toshihiro Wada, Osaka, JP;
Takahiro Miyai, Osaka, JP;
Abstract
A disclosed plasma processing apparatusincludes: a chamberhaving an opening; a stagedisposed in the chamber, the stage for placing an object to be processed; a dielectric memberclosing the opening; and a plasma generation unitdisposed on the opposite side to the chamberwith reference to the dielectric member, and configured to, when applied with a high-frequency power, generate a plasma in the chamber. The plasma generation unithas a first coilincluding one or a plurality of first conductorsconnected in parallel with each other, and a second coildisposed so as to surround the first coiland including a plurality of second conductorsconnected in parallel with each other. The number of the second conductorsis greater than the number of the first conductors