The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 24, 2025
Filed:
Dec. 26, 2022
Suteng Innovation Technology Co., Ltd., Shenzhen, CN;
Yan Song, Shenzhen, CN;
SUTENG INNOVATION TECHNOLOGY CO., LTD., Shenzhen, CN;
Abstract
An interference point determining method is provided. The method includes: obtaining a target point cloud corresponding to a highly reflective object from a target channel; obtaining a to-be-determined point cloud at the same pixel position as the target point cloud from each channel other than the target channel based on the target point cloud; based on a distance value and a reflectivity of each to-be-determined point cloud, and distance values and reflectivities respectively corresponding, to other point clouds in a neighborhood of each to-be-determined point cloud, determining whether each to-be-determined point cloud is a suspected interference point; and based on a variance between distance values of the other point clouds in the neighborhood of one to-be-determined point cloud and the one to-be-determined point cloud, or based on an interference point range determined for the one to-be-determined point cloud, determining whether the one to-be-determined point cloud is the interference point.