The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 24, 2025

Filed:

May. 26, 2020
Applicant:

Lawrence Livermore National Security, Llc, Livermore, CA (US);

Inventors:

Catherine Burcklen, Oakland, CA (US);

Tommaso Pardini, Oakland, CA (US);

Regina Soufli, Berkeley, CA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/06 (2006.01); C23C 14/00 (2006.01); C23C 14/35 (2006.01); G02B 5/08 (2006.01); G02B 5/28 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G02B 5/285 (2013.01); C23C 14/0036 (2013.01); C23C 14/0641 (2013.01); C23C 14/0652 (2013.01); C23C 14/35 (2013.01); G02B 5/0891 (2013.01); G02B 5/283 (2013.01); G03F 7/70958 (2013.01);
Abstract

A multilayer film structure, and method of making such a multilayer film structure, which includes a first layer consisting essentially of a first material and a second layer consisting essentially of a second material. In embodiments, the multilayer film structure includes a plurality of first layers alternating with a plurality of second layers. The layers are constructed by applying a N-based reactive sputtering methodology so that the layers maintain a largely amorphous microstructure and a stable and high reflectivity upon annealing at temperatures up to 800° C. for 1 hour.


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Burcklen, Catherine. (2025). Amorphous or nanocrystalline molybdenum nitride and silicon nitride multilayers (U.S. Patent No. 12339477). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12339477

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