The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 24, 2025

Filed:

Dec. 28, 2022
Applicant:

Daicel Corporation, Osaka, JP;

Inventors:

Hiroki Takenaka, Tokyo, JP;

Hiroyuki Hanato, Tokyo, JP;

Maki Kishimoto, Tokyo, JP;

Assignee:

Daicel Corporation, Osaka, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 3/00 (2006.01); G02B 7/02 (2021.01); G02B 27/00 (2006.01); G03B 17/12 (2021.01);
U.S. Cl.
CPC ...
G02B 3/0075 (2013.01); G02B 7/02 (2013.01); G02B 27/0018 (2013.01); G03B 17/12 (2013.01);
Abstract

There is provided a technique that can suppress generation of flare and/or ghost by incident light reflecting off an inner wall of the spacer in a lens unit including a wafer-level lens and a spacer. A lens unit is formed by joining a lens portion including a lens and a spacer portion including a through hole through which light emitted from the lens passes, in which the spacer portion includes, in an end surface in which the lens portion is joined, an opening portion of the through hole and an inner wall portion, which is a wall surface of an outer edge of the opening portion, and the inner wall portion has a surface roughness greater than a surface roughness of an end surface of the spacer portion opposite to the end surface in which the lens portion is joined.


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