The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 24, 2025
Filed:
May. 28, 2024
Excelitas Noblelight Gmbh, Hanau, DE;
Bernhard Graziel, Hanau, DE;
Michael Tittmann, Hanau, DE;
Vincent Krafft, Hanau, DE;
Larisa Von Riewel, Hanau, DE;
Excelitas Noblelight GmbH, Hanau, DE;
Abstract
Methods for drying a substrate. The methods include the following steps: (a) emitting infrared radiation towards a substrate moving through a process space using an emitter unit comprising at least one infrared emitter, (b) generating at least two process gas streams of a process gas directed towards the substrate, (c) drying the substrate by the action of infrared radiation and process gas on the substrate, and (d) extracting moisture-laden process gas from the process space via an extraction duct, forming an exhaust air stream leading away from the substrate. To specify a drying method which is reproducible and effective and leads to an improved result, in particular in terms of homogeneity and speed of drying of the substrate, the at least two process gas streams are guided to the infrared emitter before they act on the substrate, and an exhaust air stream is spatially assigned to each process gas stream.