The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 24, 2025

Filed:

Mar. 02, 2022
Applicants:

Eneos Corporation, Tokyo, JP;

Tokico System Solutions, Ltd., Kanagawa, JP;

Inventors:

Shinji Oshima, Chiyoda-ku, JP;

Tatsuya Rembutsu, Kakegawa, JP;

Assignees:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
F17C 5/00 (2006.01); F17C 5/06 (2006.01); F17C 13/02 (2006.01);
U.S. Cl.
CPC ...
F17C 5/007 (2013.01); F17C 5/06 (2013.01); F17C 13/025 (2013.01); F17C 2221/012 (2013.01); F17C 2223/0123 (2013.01);
Abstract

A gas filling device is provided with a first gas supply pipeline, a second gas supply pipeline, and an integrated control panel. The first gas supply pipeline supplies hydrogen gas from a multistage accumulator to a first filled tank mounted on a first vehicle. The second gas supply pipeline supplies hydrogen gas from the multistage accumulator to a second filled tank mounted on a second vehicle different from the first vehicle. At the time of filling the hydrogen gas into both of the first filled tank and the second filled tank from the multistage accumulator, the integrated control panel sets a pressure rise rate of the first filled tank or a pressure rise rate of the second filled tank to be lower than a reference pressure rise rate in accordance with a difference in pressure between the first filled tank and the second filled tank.


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