The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 24, 2025

Filed:

Oct. 11, 2023
Applicant:

Canon Anelva Corporation, Kawasaki, JP;

Inventor:

Masahiro Atsumi, Fuchu, JP;

Assignee:

Canon Anelva Corporation, Kawasaki, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 14/32 (2006.01); C23C 14/50 (2006.01); C23C 14/54 (2006.01); C23C 14/56 (2006.01); G11B 5/84 (2006.01); H01J 27/08 (2006.01); H01J 37/32 (2006.01); H01J 37/34 (2006.01);
U.S. Cl.
CPC ...
C23C 14/325 (2013.01); C23C 14/505 (2013.01); C23C 14/54 (2013.01); C23C 14/568 (2013.01); G11B 5/8408 (2013.01); H01J 27/08 (2013.01); H01J 37/32055 (2013.01); H01J 37/32064 (2013.01); H01J 37/32614 (2013.01); H01J 37/32944 (2013.01); H01J 37/34 (2013.01); H01J 37/3417 (2013.01);
Abstract

A deposition apparatus, which forms a film on a substrate, includes a rotation unit configured to rotate a target about a rotating axis; a striker configured to generate an arc discharge; a driving unit configured to drive the striker so as to make a close state which the striker closes to a side surface around the rotating axis of the target to generate the arc discharge; and a control unit configured to control rotation of the target by the rotation unit so as to change a facing position on the side surface of the target facing the striker in the close state.


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