The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 24, 2025

Filed:

Sep. 14, 2022
Applicant:

Mitsubishi Electric Research Laboratories, Inc., Cambridge, MA (US);

Inventors:

Joshua Rapp, Somerville, MA (US);

Hassan Mansour, Boston, AL (US);

Petros Boufounos, Winchester, AL (US);

Philip Orlik, Cambridge, MA (US);

Toshiaki Koike Akino, Cambridge, AL (US);

Kieran Parsons, Cambridge, MA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
A61B 5/00 (2006.01); G01B 9/02 (2022.01); G01B 9/0209 (2022.01); G01B 9/02091 (2022.01);
U.S. Cl.
CPC ...
A61B 5/0066 (2013.01); G01B 9/02088 (2013.01); G01B 9/0209 (2013.01); G01B 9/02091 (2013.01); G01B 9/02044 (2013.01);
Abstract

An optical coherence tomography (OCT) system comprises an interferometer configured to split incident light into a reference beam and a test beam, and to interfere the test beam reflected from the specimen with the reference beam reflected from a reference mirror to produce an interference pattern. The OCT system also comprises a spectrometer configured to analyze spectral components of the interference pattern at non-uniformly sampled wavenumbers. A computer-readable memory of the OCT system is configured to store a measurement model with elements connecting different depth values with different non-uniformly sampled wavenumbers and weighted with weights derived from a power spectral density (PSD) of the incident light for corresponding wavenumbers. The OCT system further comprises a processor configured to determine the profilometry measurements of the specimen as a maximum likelihood estimate of the specimen surface depth by back-projection of the measured intensities with the measurement model.


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