The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 17, 2025

Filed:

May. 31, 2022
Applicant:

Fuji Electric Co., Ltd., Kawasaki, JP;

Inventor:

Shinichiro Matsunaga, Matsumoto, JP;

Assignee:

FUJI ELECTRIC CO., LTD., Kawasaki, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10D 12/00 (2025.01); H10D 30/66 (2025.01); H10D 62/00 (2025.01); H10D 62/10 (2025.01);
U.S. Cl.
CPC ...
H10D 62/102 (2025.01); H10D 12/481 (2025.01); H10D 30/665 (2025.01); H10D 30/668 (2025.01);
Abstract

A semiconductor device includes a first semiconductor layer of a first conductivity type; a second semiconductor layer of the first conductivity type; a first semiconductor region of a second conductivity type; a second semiconductor region of the first conductivity type; a trench; a gate insulating film; a gate electrode; a third semiconductor region of the second conductivity type; a fourth semiconductor region of the second conductivity type; a fifth semiconductor region of the first conductivity type, selectively provided in the second semiconductor layer and having an impurity concentration lower than an impurity concentration of the second semiconductor layer; a first electrode; and a second electrode. The fifth semiconductor region has one surface in contact with the first semiconductor region, another surface in contact with the third semiconductor region, and a side surface in contact with the gate insulating film.


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