The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 17, 2025

Filed:

Mar. 29, 2019
Applicant:

Imperial College Innovations Limited, London, GB;

Inventors:

Anthony Edward George Cass, London, GB;

Stefan Maier, London, GB;

Thao Thi Le, London, GB;

Firat Guder, London, GB;

Maximilian Grell, London, GB;

Michael Kasimatis, London, GB;

Giandrin Barandun, London, GB;

Estefania Nunez-Bajo, London, GB;

Can Dincer, London, GB;

Alberto Lauri, London, GB;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H05K 3/12 (2006.01); C23C 18/16 (2006.01); C23C 18/42 (2006.01); H05K 1/03 (2006.01);
U.S. Cl.
CPC ...
H05K 1/038 (2013.01); C23C 18/1653 (2013.01); C23C 18/1692 (2013.01); C23C 18/42 (2013.01); H05K 3/12 (2013.01); H05K 2203/1131 (2013.01);
Abstract

A method of manufacturing a metal fabric or membrane, the method comprises providing an ink comprising a plurality of semiconductor particles disposed in a first solvent. The method comprises applying the ink to a fabric or membrane to obtain a fabric or membrane comprising a plurality of semiconductor particles. Finally, the method comprises contacting the fabric or membrane comprising the plurality of semiconductor particles with a deposition solution comprising a second solvent, an autocatalytic agent, and metal cations to thereby cause a reaction to occur such that the metal cations are reduced and at least partially displace the semiconductor particles, to thereby provide a metal fabric or membrane.


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