The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 17, 2025
Filed:
Feb. 21, 2023
Tencent America Llc, Palo Alto, CA (US);
Xifeng Gao, Tallahassee, FL (US);
Zhen Chen, Palo Alto, CA (US);
Zherong Pan, Bellevue, WA (US);
Kui Wu, Los Angeles, CA (US);
TENCENT AMERICA LLC, Palo Alto, CA (US);
Abstract
According to an aspect of the disclosure, a method of generating a low-poly mesh for a three-dimensional (3D) model is provided. In the method, an edge-collapse operation is performed on each of a plurality of edges of an input mesh to generate a simplified mesh in which a number of faces of the input mesh is reduced by the edge-collapse operation. A position of at least one vertex of the simplified mesh is updated to generate an updated mesh in which a distance between the simplified mesh and the input mesh is reduced. The low-poly mesh is generated based on an aligned mesh in which positions of vertices of the updated mesh are optimized by minimizing a shape difference between the simplified mesh and the updated mesh.