The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 17, 2025
Filed:
Jan. 07, 2020
Lpe S.p.a., Baranzate, IT;
Denso Corporation, Aichi-Pref, JP;
Francesco Corea, Baranzate, IT;
Danilo Crippa, Baranzate, IT;
Maurilio Meschia, Baranzate, IT;
Silvio Preti, Baranzate, IT;
Yuichiro Tokuda, Aichi-Pref, JP;
LPE S.P.A, Baranzate, IT;
DENSO CORPORATION, Aichi-Pref, JP;
Abstract
The reaction chamber () is used for a deposition reactor of layers of semiconductor material on substrates; it comprises a tube () made of quartz and having a cylindrical shape and adapted to be positioned in use so that its axis () is vertical; the tube () has a cylindrical inner interspace () which extends along the entire length of the tube () and which is adapted to accommodate a flowing liquid; the chamber () further comprises an annular closing element () made of quartz and fixed to a first lower end of the tube () so as to close the interspace () preventing the liquid from flowing out of the interspace at the bottom; at the top, the closing element () has an annular recess () facing the interspace () so that the flowing liquid can reach the recess () at the bottom; the chamber () further comprises a set of internal conduits () internal to the interspace (), wherein said internal conduits () extend from the first lower region of the tube () till a second upper region of the tube () to facilitate circulation of the flowing liquid in the interspace ().