The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 17, 2025
Filed:
Oct. 12, 2020
East China University of Science and Technology, Shanghai, CN;
Suzhou Kunhuang New Material Technology Co., Ltd., Suzhou, CN;
Weihong Zhu, Shanghai, CN;
Zhigang Zheng, Shanghai, CN;
Huijun Li, Shanghai, CN;
Honglong Hu, Shanghai, CN;
EAST CHINA UNIVERSITY OF SCIENCE AND TECHNOLOGY, Shanghai, CN;
SUZHOU KUNHUANG NEW MATERIAL TECHNOLOGY CO., LTD., Jiangsu, CN;
Abstract
The present disclosure discloses a novel multi-stable and erasable anti-counterfeiting technology with controlled reflection color and the application thereof in optical coding. The method and use are characterized by high thermal stability and robust fatigue resistance, and the realization thereof relies on the material system composed of an intrinsic chiral diarylethene molecule based on steric hindrance ethene bridge and a liquid crystal (LC) material disclosed herein. The diarylethene based on steric hindrance ethene bridge has the following structural feature: The material system composed of a diarylethene compound based on steric hindrance ethene bridge and an LC can be prepared by a simple preparation process from cheap raw materials, can achieve a wide spectral color adjustment range, and has excellent thermal stability and fatigue resistance, which is expected to be further widely used in the fields of dual erasable anti-counterfeiting and optical information encoding with high thermal stability and strong fatigue resistance.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile