The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 17, 2025
Filed:
Oct. 26, 2020
Univation Technologies, Llc, Houston, TX (US);
Bo Liu, Lake Jackson, TX (US);
Joel D. Wieliczko, South Charleston, WV (US);
Ayush A. Bafna, Manvel, TX (US);
Daudi A. Abe, The Woodlands, TX (US);
Univation Technologies, LLC, Houston, TX (US);
Abstract
A method of increasing bubble stability of a needful high molecular weight bimodal high-density polyethylene resin in need thereof, the method comprising subjecting the needful high molecular weight bimodal high-density polyethylene resin to a determined amount of oxygen tailoring of the resin so as to independently increase both the resin's melt storage modulus G' (at G″=3000 pascals) and complex viscosity ratio SH1000, and thereby make an oxygen-tailored high molecular weight bimodal high-density polyethylene resin having a targeted increase in bubble stability. The method uses a tailoring effective amount of molecular oxygen (O) to achieve the desired oxygen tailoring. The method uses these advanced rheological properties from dynamic mechanical spectroscopy, but analyzes the data in a different way that is more sensitive to changes in resin composition and properties, and yet achieves a resin regime having a targeted increase in bubble stability.